CIGS Evaporation System


  • Modified Varian 3125 with high capacity diffusion pump
  • Five independently-controlled sources
    • Luxel Radak II furnaces for Cu, In and Ga
    • Specialty heaters for Se and Na
  • Uniform films over 10 x 10 cm substrate area
  • Planetary substrate holder available for multisubstrate deposition
  • Inficon XTC controller for in situ measurement molecular flux
  • Fully automated pressure, furnace and substrate temperatures
  • Cold trap with Polycold refrigerant
  • Halogen substrate heating



CIS device

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