PECVD System

PECVD System

  • Deposition chambers by MV Systems
  • Dual deposition chamber with load lock
  • Turbomolecular pumps for high purity pumpdown
  • Roots blower for processing
  • Continuous or pulsed RF (13.6MHz) plasma operation
  • SiH4, GeH2, H2, CH4, B2H6 & PH3 gases installed
  • Inficon RGA for contaminant monitoring
  • Fully automated pressure, flow, temperature & plasma power

system

dual-chamber

µ-cr SiC film


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