Sputtering System

  • Modified PE 2400 with LH 450 l/s turbomolecular pump
  • Three magnetron sputtering guns (AJA International, 2")
    • Flexible magnet configuration for rate optimization
    • DC or RF plasma power option
  • Mass flow controllers (MKS) for precise metering of gas mixtures
  • Inficon XTM in situ film thickness monitor
  • Fully automated flow, substrate temperature, plasma power
  • Halogen substrate heaters

system


chamber


sputtered Fe2O3 films


Theme based off Danetsoft. Site by Hawaii Web Consulting