PECVD System

• Deposition chambers by MV Systems
• Dual deposition chamber with load lock
• Turbomolecular pumps for high purity pumpdown
• Roots blower for processing
• Continuous or pulsed RF (13.6MHz) plasma operation
• SiH4, GeH2, H2, CH4, B2H6 & PH3 gases installed
• Inficon RGA for contaminant monitoring
• Fully automated pressure, flow, temperature & plasma power

system

dual-chamber

µ-cr SiC film