CIGS Evaporation System
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Modified Varian 3125 with high capacity diffusion pump
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Five independently-controlled sources
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Luxel Radak II furnaces for Cu, In and Ga
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Specialty heaters for Se and Na
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Uniform films over 10 x 10 cm substrate area
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Planetary substrate holder available for multisubstrate deposition
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Inficon XTC controller for in situ measurement molecular flux
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Fully automated pressure, furnace and substrate temperatures
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Cold trap with Polycold refrigerant
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Halogen substrate heating
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system |
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chamber |
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CIS device |
