PECVD System

• Deposition chambers by MV Systems
• Dual deposition chamber with load lock
• Turbomolecular pumps for high purity pumpdown
• Roots blower for processing
• Continuous or pulsed RF (13.6MHz) plasma operation
• SiH4, GeH2, H2, CH4, B2H6 & PH3 gases installed
• Inficon RGA for contaminant monitoring
• Fully automated pressure, flow, temperature & plasma power

Pictures may be found on the graphic version.

Facilities Menu

• Fuel Cell Test Facility
• Thin Films Lab
• Renewable Resources Research Lab
• Ocean Resources and Applications Laboratory
• Electrochemical Power Systems Lab
• Biomass and Fuels Processing Lab

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Contact Us

Hawaii Natural Energy Institute
1680 East-West Road, POST 109
Honolulu, HI 96822
Phone: (808) 956-8890
Fax: (808) 956-2336
Email: hnei@hawaii.edu

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This page was last updated on Monday, December 9, 2002

[GRAPHIC VERSION]