Sputtering System
- Modified PE 2400 with LH 450 l/s turbomolecular pump
- Three magnetron sputtering guns (AJA International, 2")
- Flexible magnet configuration for rate optimization
- DC or RF plasma power option
- Mass flow controllers (MKS) for precise metering of gas mixtures
- Inficon XTM in situ film thickness monitor
- Fully automated flow, substrate temperature, plasma power
- Halogen substrate heaters
Pictures may be found on the graphic version.
Hawaii Natural Energy Institute
1680 East-West Road, POST 109
Honolulu, HI 96822
Phone: (808) 956-8890
Fax: (808) 956-2336
Email: hnei@hawaii.edu
Please read the Website DISCLAIMER.
This page was last updated on Monday, December 9, 2002
[GRAPHIC VERSION]
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