| |
CIGS Evaporation System
- Modified Varian 3125 with high capacity diffusion pump
- Five independently-controlled sources
- Luxel Radak II furnaces for Cu, In and Ga
- Specialty heaters for Se and Na
- Uniform films over 10 x 10 cm substrate area
- Planetary substrate holder available for multisubstrate deposition
- Inficon XTC controller for in situ measurement molecular flux
- Fully automated pressure, furnace and substrate temperatures
- Cold trap with Polycold refrigerant
- Halogen substrate heating
|
| system |
|
| chamber |
|
| CIS device |
|
|