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PECVD System
- Deposition chambers by MV Systems
- Dual deposition chamber with load lock
- Turbomolecular pumps for high purity pumpdown
- Roots blower for processing
- Continuous or pulsed RF (13.6MHz) plasma operation
- SiH4, GeH2, H2, CH4, B2H6 & PH3 gases installed
- Inficon RGA for contaminant monitoring
- Fully automated pressure, flow, temperature & plasma power
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| system |
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| dual-chamber |
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| µ-cr SiC film |
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