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University of Hawaii at Manoa
Hawaii Natural Energy Institute
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Employee Site
PECVD System
Deposition chambers by MV Systems
Dual deposition chamber with load lock
Turbomolecular pumps for high purity pumpdown
Roots blower for processing
Continuous or pulsed RF (13.6MHz) plasma operation
SiH4, GeH2, H2, CH4, B2H6 & PH3 gases installed
Inficon RGA for contaminant monitoring
Fully automated pressure, flow, temperature & plasma power
system
dual-chamber
µ-cr SiC film
