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University of Hawaii at Manoa
Hawaii Natural Energy Institute
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Sputtering System
Modified PE 2400 with LH 450 l/s turbomolecular pump
Three magnetron sputtering guns (AJA International, 2")
Flexible magnet configuration for rate optimization
DC or RF plasma power option
Mass flow controllers (MKS) for precise metering of gas mixtures
Inficon XTM in situ film thickness monitor
Fully automated flow, substrate temperature, plasma power
Halogen substrate heaters
system
chamber
sputtered Fe2O3 films
