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Sputtering System
- Modified PE 2400 with LH 450 l/s turbomolecular pump
- Three magnetron sputtering guns (AJA International, 2")
- Flexible magnet configuration for rate optimization
- DC or RF plasma power option
- Mass flow controllers (MKS) for precise metering of gas mixtures
- Inficon XTM in situ film thickness monitor
- Fully automated flow, substrate temperature, plasma power
- Halogen substrate heaters
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| system |
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| chamber |
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| sputtered Fe2O3 films |
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